High purity silica reflective heat shield development

Progress is reported on the development of a high purity reflective heat shield material. Silicon dioxide was selected as the material because it is highly reflective in the correct wavelength band, has good ablation characteristics, is thermal shock resistant, and is readily fabricated to full size at reasonable cost. Conclusions indicate that: reflectance is affected by purity and morphology; the pure material is readily available; required purity and morphology can be maintained with reasonable care; high reflectances are determined (0.99 from 0.4 to 1.2 microns); major processing steps are defined; and the material appears to be cost effective. It is indicated that the materials are developed to the point of readiness for full scale fabrication and characterization.