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Problems with state-of-the-art float zone siliconAn application in which CCD optical imaging arrays with 250,000 elements are fabricated from the best commercially available float zone Si is described. Two image defects are described which appear to be related to the starting material. The striation effect appears to be caused by resistivity and recombination center variations. Up to 30 percent variations in resistivity was measured across a sample.
Document ID
19810010627
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Jastrzebski, L.
(Rockwell International Corp. Canoga Park, CA, United States)
Date Acquired
August 11, 2013
Publication Date
December 1, 1980
Publication Information
Publication: NASA. Marshall Space Flight Center Float Zone Workshop
Subject Category
Astronautics (General)
Accession Number
81N19154
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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