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Gallium phosphide high temperature diodesHigh temperature (300 C) diodes for geothermal and other energy applications were developed. A comparison of reverse leakage currents of Si, GaAs, and GaP was made. Diodes made from GaP should be usable to 500 C. A Liquid Phase Epitaxy (LPE) process for producing high quality, grown junction GaP diodes is described. This process uses low vapor pressure Mg as a dopant which allows multiple boat growth in the same LPE run. These LPE wafers were cut into die and metallized to make the diodes. These diodes produce leakage currents below ten to the -9th power A/sq cm at 400 C while exhibiting good high temperature rectification characteristics. High temperature life test data is presented which shows exceptional stability of the V-I characteristics.
Document ID
19820007449
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Chaffin, R. J.
(Sandia National Labs. Albuquerque, NM, United States)
Dawson, L. R.
(Sandia National Labs. Albuquerque, NM, United States)
Date Acquired
August 10, 2013
Publication Date
January 1, 1981
Publication Information
Publication: NASA. Lewis Research Center Proc. of the Conf. on High-Temp. Electron.
Subject Category
Electronics And Electrical Engineering
Accession Number
82N15322
Funding Number(s)
CONTRACT_GRANT: DE-AC04-76DP-00789
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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