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Kinematical and mechanical aspects of wafer slicingSome recently achieved results concerning the technological fundamentals of slurry sawing are presented. The specific material removal process and the related kinematic and geometric contact conditions between workpiece and saw blade are described. The result of a functional description of the slurry sawing process is presented, expressing the main process criteria, such as infeed per stroke, specific removal rate, specific tool wear, and vertical stroke intensity, in terms of the dominating process parameters, such as stroke length, width of workpiece, stroke frequency, specific cutting force and slurry specification.
Document ID
19820015787
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Werner, P. G.
(Bremen Univ.)
Date Acquired
August 10, 2013
Publication Date
February 1, 1982
Publication Information
Publication: JPL Proc. of the Low-Cost Solar Array Wafering Workshop
Subject Category
Energy Production And Conversion
Accession Number
82N23663
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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