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Low-Dead-Volume Inlet for Vacuum ChamberGas introduction from near-ambient pressures to high vacuum traditionally is accomplished either by multi-stage differential pumping that allows for very rapid response, or by a capillary method that allows for a simple, single-stage introduction, but which often has a delayed response. Another means to introduce the gas sample is to use the multi-stage design with only a single stage. This is accomplished by using a very small conductance limit. The problem with this method is that a small conductance limit will amplify issues associated with dead-volume. As a result, a high-vacuum gas inlet was developed with low dead-volume, allowing the use of a very low conductance limit interface. Gas flows through the ConFlat flange at a relatively high flow rate at orders of magnitude greater than through the conductance limit. The small flow goes through a conductance limit that is a double-sided ConFlat.
Document ID
20110011960
Acquisition Source
Kennedy Space Center
Document Type
Other - NASA Tech Brief
Authors
Naylor, Guy
(ASRC Aerospace Corp. Cocoa Beach, FL, United States)
Arkin, C.
(ASRC Aerospace Corp. Cocoa Beach, FL, United States)
Date Acquired
August 25, 2013
Publication Date
April 1, 2011
Publication Information
Publication: NASA Tech Briefs, April 2011
Subject Category
Technology Utilization And Surface Transportation
Report/Patent Number
KSC-13317
Distribution Limits
Public
Copyright
Public Use Permitted.
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