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High-performance low-power CMOS memories using silicon-on-sapphire technology.MOS/silicon-on-sapphire (SOS) technology is shown to permit the realization of large-scale integrated arrays that combine the best features of monolithic bipolar and MOS technologies. The perfect isolation and reduced capacitance of SOS technology make possible static MOS circuits with nearly an order-of-magnitude improvement in speed and dynamic power dissipation over their monolithic counterparts. CMOS/SOS memory arrays have been fabricated with speeds comparable to TTL bipolar memory arrays even when operated at TTL compatible levels. Quiescent power dissipation of two described arrays is typically less than 1 microwatt/bit. The SOS/MOS technology is compatible with both aluminum and self-aligned silicon-gate processing.
Document ID
19720042899
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Boleky, E. J.
(Stanford University Stanford, Calif., United States)
Meyer, J. E.
(RCA Laboratories Princeton, N.J., United States)
Date Acquired
August 6, 2013
Publication Date
April 1, 1972
Publication Information
Publication: IEEE Journal of Solid-State Circuits
Volume: SC-7
Subject Category
Electronic Equipment
Accession Number
72A26565
Funding Number(s)
CONTRACT_GRANT: F33615-69-C-1499
CONTRACT_GRANT: NAS12-2207
Distribution Limits
Public
Copyright
Other

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