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Ellipsometer for measurement in ultrahigh vacuumEllipsometer, used with ultrahigh vacuum, allows measurement of varied angles of incidence. Vacuum chamber, directly incorporated into optical bench systems, allows varied angle measurements to be taken through same region of a window.
Document ID
19760000035
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Walter, H. U.
Weitzenkamp, L. A.
Peters, P. N.
Date Acquired
August 8, 2013
Publication Date
March 1, 1976
Publication Information
Publication: NASA Tech Briefs
Volume: 1
Issue: 1
ISSN: 0145-319X
Subject Category
Physical Sciences
Report/Patent Number
MFS-23130
Accession Number
76B10035
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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