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Plasma polymerization of an ethylene-nitrogen gas mixtureA procedure has been developed whereby nitrogen can be incorporated into an organic film from an ethylene-nitrogen gas mixture using an internal electrode capacitively coupled radio frequency reactor. The presence of nitrogen has been shown directly by infrared transmittance spectra and electron spectroscopic chemical analysis data, and further indirect evidence was provided by dielectric measurements and by the reverse osmosis properties of the film. Preparation of a nitrogen containing film did not require vapor from an organic nitrogen containing liquid monomer. Some control over the bonding and stoichiometry of the polymer film was provided by the added degree of freedom of the nitrogen partial pressure in the gas mixture. This new parameter strongly affected the dielectric properties of the plasma polymerized film and could affect the reverse osmosis behavior.
Document ID
19760038834
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Hudis, M.
(NASA Ames Research Center Moffett Field, CA, United States)
Wydeven, T.
(NASA Ames Research Center Biotechnology Div., Moffett Field, Calif., United States)
Date Acquired
August 8, 2013
Publication Date
January 1, 1975
Publication Information
Publication: Journal of Polymer Science
Subject Category
Inorganic And Physical Chemistry
Accession Number
76A21800
Distribution Limits
Public
Copyright
Other

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