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Applications of ion implantation for high efficiency silicon solar cellsIon implantation is utilized for the dopant introduction processes necessary to fabricate a silicon solar cell. Implantation provides a versatile powerful tool for development of high efficiency cells. Advantages and problems of implantation and the present status of developmental use of the technique for solar cells are discussed.
Document ID
19780005595
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Minnucci, J. A. (Simulation Physics, Inc. Foxborough, MA, United States)
Kirkpatrick, A. R. (Simulation Physics, Inc. Foxborough, MA, United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1977
Publication Information
Publication: NASA. Lewis Res. Center Solar Cell High Efficiency and Radiation Damage
Subject Category
Energy Production And Conversion
Accession Number
78N13538
Funding Number(s)
CONTRACT_GRANT: F33615-75-C-2006
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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