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Chemical-vapor-deposition reactorReactor utilizes multiple stacked trays compactly arranged in paths of horizontally channeled reactant gas streams. Design allows faster and more efficient deposits of film on substrates, and reduces gas and energy consumption. Lack of dead spots that trap reactive gases reduces reactor purge time.
Document ID
19790000075
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Chern, S.
Date Acquired
August 10, 2013
Publication Date
August 1, 1979
Publication Information
Publication: NASA Tech Briefs
Volume: 4
Issue: 1
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
NPO-14137
Accession Number
79B10075
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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