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Photomask and pattern programsPackage of computer programs helps designers with layout and graphics of photomasks. Photomasks are specifically useful to applications involving fine reproducibility, repetition, and fabrication on planar surfaces of materials, items fabricated from photomasks include circuit boards, magnetic bubble devices and integrated optic circuits.
Document ID
19790000434
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Kirschman, R. K.
(Caltech)
Date Acquired
August 10, 2013
Publication Date
April 1, 1980
Publication Information
Publication: NASA Tech Briefs
Volume: 4
Issue: 3
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-14419
Accession Number
79B10434
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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