Sputtering technology in solid film lubricationCurrent and potential sputtering technology is reviewed as it applies primarily to the deposition of MoS2, though such lubricants as WS2 and PTFE are also considered. It is shown by electron microscopy and surface sensitive analytical techniques that the lubricating properties of sputtered MoS2 films are directly influenced by the sputtering parameters selected (i.e., power density, pressure, sputter etching, dc-biasing, etc.), substrate temperature, chemistry, topography, and environmental conditions during the friction test. Electron micrographs and diffractograms of sputtered MoS2 films clearly show the resultant changes in film morphology which affect film adherence and frictional properties.
Document ID
19790032650
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Spalvins, T. (NASA Lewis Research Center Cleveland, Ohio, United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1978
Subject Category
Mechanical Engineering
Meeting Information
Meeting: International Conference on Solid Lubrication