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Application of ESCA to the determination of stoichiometry in sputtered coatings and interface regionsX-ray Photoelectron Spectroscopy (XPS) was used to characterize radiofrequency sputter deposited films of several refractory compounds. Both the bulk film properties such as purity and stoichiometry and the character of the interfacial region between the film and substrate were examined. The materials were CrB2, MoS2, Mo2C, and Mo2B5 deposited on 440C steel. It was found that oxygen from the sputtering target was the primary impurity in all cases. Biasing improves the film purity. The effect of biasing on film stoichiometry is different for each compound. Comparison of the interfacial composition with friction data suggests that adhesion of these films is improved if a region of mixed film and iron oxides can be formed.
Document ID
19790032651
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Wheeler, D. R.
(NASA Lewis Research Center Cleveland, Ohio, United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1978
Subject Category
Mechanical Engineering
Meeting Information
Meeting: International Conference on Solid Lubrication
Location: Denver, CO
Start Date: August 15, 1978
End Date: August 18, 1978
Accession Number
79A16664
Distribution Limits
Public
Copyright
Other

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