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Plasma polymerization of ethylene in an atmospheric pressure-pulsed dischargeThe polymerization of ethylene in an atmospheric pressure-pulsed discharge has been studied. Partial pressures of ethylene up to 4 kN/sq m were used with helium as a diluent. Deposition rates (on glass slides) were the same throughout the discharge volume over a wide range of operating conditions. These rates were in the 1-2 A/sec range. The films were clear, soft, and showed good adhesion to the glass substrates. Oligomers large enough to visibly scatter 637.8-nm light were observed in the gas phase under all conditions in which film deposition occurred. The experimental results suggest that Brownian diffusion of these oligomers was the rate-limiting step in the film deposition process.
Document ID
19790056258
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Donohoe, K.
(NASA Ames Research Center Moffett Field, CA, United States)
Wydeven, T.
(NASA Ames Research Center Moffett Field, Calif., United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1979
Publication Information
Publication: Journal of Applied Polymer Science
Volume: 23
Subject Category
Chemistry And Materials (General)
Accession Number
79A40271
Distribution Limits
Public
Copyright
Other

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