NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Survey of ion plating sourcesIon plating is a plasma deposition technique where ions of the gas and the evaporant have a decisive role in the formation of a coating in terms of adherence, coherence, and morphological growth. The range of materials that can be ion plated is predominantly determined by the selection of the evaporation source. Based on the type of evaporation source, gaseous media and mode of transport, the following will be discussed: resistance, electron beam sputtering, reactive and ion beam evaporation. Ionization efficiencies and ion energies in the glow discharge determine the percentage of atoms which are ionized under typical ion plating conditions. The plating flux consists of a small number of energetic ions and a large number of energetic neutrals. The energy distribution ranges from thermal energies up to a maximum energy of the discharge. The various reaction mechanisms which contribute to the exceptionally strong adherence - formation of a graded substrate/coating interface are not fully understood, however the controlling factors are evaluated. The influence of process variables on the nucleation and growth characteristics are illustrated in terms of morphological changes which affect the mechanical and tribological properties of the coating.
Document ID
19800025870
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Spalvins, T.
(NASA Lewis Research Center Cleveland, Ohio, United States)
Date Acquired
August 10, 2013
Publication Date
October 1, 1979
Subject Category
Mechanical Engineering
Meeting Information
Meeting: National Vacuum Symposium
Location: New York, NY
Start Date: October 2, 1979
End Date: October 5, 1979
Sponsors: American Vacuum Society
Accession Number
80A10040
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available