Homogeneous alignment of nematic liquid crystals by ion beam etched surfacesA wide range of the ion beam etch parameters are capable of producing uniform homogeneous alignment of nematic liquid crystals on SiO2 films. The alignment surfaces were generated by obliquely incident argon ions; a smaller range of ion beam parameters was also investigated with ZrO2 films and found suitable for homogeneous alignment. Extinction ratios were very high, and twist and tilt-bias angles were very small. The SEM results indicate a parallel oriented surface structure on the ion beam etched surfaces which may determine alignment.
Document ID
19800041837
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Wintucky, E. G. (NASA Lewis Research Center Cleveland, Ohio, United States)
Mahmood, R. (NASA Lewis Research Center Cleveland, OH, United States)
Johnson, D. L. (Kent State University Kent, Ohio, United States)