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Silicon oxidation in fluoride solutionsSilicon is produced in a NaF, Na2SiF6, and Na matrix when SiF4 is reduced by metallic sodium. Hydrogen is evolved during acid leaching to separate the silicon from the accompanying reaction products, NaF and Na2SiF6. The hydrogen evolution reaction was studied under conditions simulating leaching conditions by making suspensions of the dry silicon powder in aqueous fluoride solutions. The mechanism for the hydrogen evolution is discussed in terms of spontaneous oxidation of silicon resulting from the cooperative effects of (1) elemental sodium in the silicon that reacts with water to remove a protective silica layer, leaving clean reactive silicon, and (2) fluoride in solution that complexes with the oxidized silicon in solution and retards formation of a protective hydrous oxide gel.
Document ID
19800062976
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Sancier, K. M.
(SRI International Corp. Menlo Park, CA, United States)
Kapur, V.
(SRI International Menlo Park, Calif., United States)
Date Acquired
August 10, 2013
Publication Date
August 1, 1980
Publication Information
Publication: Electrochemical Society
Subject Category
Inorganic And Physical Chemistry
Accession Number
80A47146
Funding Number(s)
CONTRACT_GRANT: NAS7-100
CONTRACT_GRANT: JPL-954471
Distribution Limits
Public
Copyright
Other

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