NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
XPS Study of SiO2 and the Si/SiO2 InterfaceX-ray photoelectron spectroscopy (XPS) is analytical technique for understanding electronic structure of atoms close to surface in solids, in preference to bulk structure of material. Study found evidence for core-level chemical shifts arising from changes in local structural environment in amorphous SiO2 and at Si/SiO2 interface. Observed XPS spectra may be understood as sequential convolution of several functions, each with well-defined physical interpretation.
Document ID
19810000285
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Grunthaner, F. J.
(CALTECH)
Grunthaner, P. J.
(CALTECH)
Vasquez, R. P.
(CALTECH)
Lewis, B. F.
(CALTECH)
Maserjian, J.
(CALTECH)
Madhukar, A.
(CALTECH)
Date Acquired
August 11, 2013
Publication Date
December 1, 1982
Publication Information
Publication: NASA Tech Briefs
Volume: 6
Issue: 3
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
NPO-14968
Accession Number
81B10285
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

Available Downloads

There are no available downloads for this record.
No Preview Available