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Future float zone development in industryThe present industrial requirements for float zone silicon are summarized. Developments desired by the industry in the future are reported. The five most significant problems faced today by the float zone crystal growth method in industry are discussed. They are economic, large diameter, resistivity uniformity, control of carbon, and swirl defects.
Document ID
19810010626
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Sandfort, R. M. (Monsanto Co. Saint Peters, MO, United States)
Date Acquired
August 11, 2013
Publication Date
December 1, 1980
Publication Information
Publication: NASA. Marshall Space Flight Center Float Zone Workshop
Subject Category
Astronautics (General)
Accession Number
81N19153
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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IDRelationTitle19810010617Collected WorksFloat Zone Workshop
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