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Epitaxial and polycrystalline GaAs solar cells using OM-CVD techniquesGaAs epitaxial films were grown by chemical vapor deposition using organo-metallic sources (OM-CVD) on single crystal and polycrystalline bulk GaAs, as well as on bulk polycrystalline and recrystallized thin-film Ge substrates. Details of Antireflecting Metal-Oxide-Semiconductor (AMOS) solar cells fabricated on GaAs films grown on bulk polycrystalline Ge and recrystallized Ge thin-film substrates will be discussed, as well as preliminary photovoltaic results obtained for n(+)/p homojunction structures.
Document ID
19810042883
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Yeh, Y. C. M.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Wang, K. L.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Shin, B. K.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Stirn, R. J.
(California Institute of Technology, Jet Propulsion Laboratory, Pasadena Calif., United States)
Date Acquired
August 11, 2013
Publication Date
January 1, 1980
Subject Category
Energy Production And Conversion
Meeting Information
Meeting: Photovoltaic Specialists Conference
Location: San Diego, CA
Start Date: January 7, 1980
End Date: January 10, 1980
Accession Number
81A27287
Distribution Limits
Public
Copyright
Other

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