Epitaxial and polycrystalline GaAs solar cells using OM-CVD techniquesGaAs epitaxial films were grown by chemical vapor deposition using organo-metallic sources (OM-CVD) on single crystal and polycrystalline bulk GaAs, as well as on bulk polycrystalline and recrystallized thin-film Ge substrates. Details of Antireflecting Metal-Oxide-Semiconductor (AMOS) solar cells fabricated on GaAs films grown on bulk polycrystalline Ge and recrystallized Ge thin-film substrates will be discussed, as well as preliminary photovoltaic results obtained for n(+)/p homojunction structures.
Document ID
19810042883
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Yeh, Y. C. M. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Wang, K. L. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Shin, B. K. (Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Stirn, R. J. (California Institute of Technology, Jet Propulsion Laboratory, Pasadena Calif., United States)