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Charging control techniquesTransparent conductive thin films of indium oxide and indium-tin oxide were evaluated for their properties to control charge buildup on satellite materials. Both oxide coatings were evaluated for their uniformity, stability, reproducibility and characteristics on various substrate materials such as FEP Teflon, Kapton, and glass. The process development toward optimization and characterization of these thin semiconductor oxide coatings and the evaluation on large sizes performed for qualification for use on thermal control satellite materials is described. The materials have been characterized in multiple energy electron plasma environment and at low temperatures. All radiation measurements of the coatings under simulated substorm conditions have exhibited the characteristics of stable charge control. Measurement of surface potential during and after irradiation by electrons up to 30 KeV and ionizing gamma radiation show an effective stable grounding surface.
Document ID
19820006359
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Schmidt, R. E.
(General Electric Co. Fairfield, CT, United States)
Date Acquired
August 10, 2013
Publication Date
October 1, 1981
Publication Information
Publication: NASA. Lewis Research Center Spacecraft Charging Technol., 1980
Subject Category
Spacecraft Design, Testing And Performance
Accession Number
82N14232
Funding Number(s)
CONTRACT_GRANT: F33615-78-C-5119
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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