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Analysis of I-V characteristics of negatively biased panels in a magneto-plasmaCurrent voltage characteristics of negatively biased panels placed in a plasma environment were analyzed for panel size, electron density, and superimposed magnetic field. It is indicated that the thickness of the surrounding sheath and its rate of growth with bias potential depends on all these parameters in a nonlinear manner.
Document ID
19820015251
Acquisition Source
Legacy CDMS
Document Type
Other - Other
Authors
Miller, D. D.
(Central Missouri State Univ. Warrensburg, MO, United States)
Date Acquired
August 10, 2013
Publication Date
August 20, 1981
Publication Information
Publication: Houston Univ. The 1981 NASA ASEE Summer Fac. Fellowship Program, Vol. 2
Subject Category
Plasma Physics
Accession Number
82N23125
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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