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Temperature dependence of the NO + O3 reaction rate from 195 to 369 KThe temperature dependence of the NO + O3 reaction rate was examined by means of the fast flow technique. Several different experimental conditions and detection schemes were employed. With excess NO or excess O3, NO2 chemiluminescence was monitored. In addition, with excess O3, NO was followed by fluorescence induced by an NO microwave discharge lamp. The results of the three independent sets of data are compared and found to agree within experimental error, indicating the absence of secondary chemistry which might complicate the kinetics. The data exhibit curvature on an Arrhenius plot; however, the simple Arrhenius expression k = (2.6 + or - 0.8) x 10 to the -12th exp(-1435 + or - 64/T) cu cm/molecule s is an adequate description for T between 195 and 369 K. This result is compared to earlier determinations.
Document ID
19820034940
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Michael, J. V.
(NASA Goddard Space Flight Center Greenbelt, MD, United States)
Allen, J. E., Jr.
(NASA Goddard Space Flight Center Greenbelt, MD, United States)
Brobst, W. D.
(NASA Goddard Space Flight Center Laboratory for Planetary Atmospheres, Greenbelt, MD, United States)
Date Acquired
August 10, 2013
Publication Date
December 24, 1981
Publication Information
Publication: Journal of Physical Chemistry
Volume: 85
Subject Category
Inorganic And Physical Chemistry
Accession Number
82A18475
Distribution Limits
Public
Copyright
Other

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