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Compensation mechanism in liquid encapsulated Czochralski GaAs Importance of melt stoichiometryIt is shown that the key to reproducible growth of undoped semi-insulating GaAs by the liquid encapsulated Czochralski (LEC) technique is the control over the melt stoichiometry. Twelve crystals were grown from stoichiometric and nonstoichiometric melts. The material was characterized by secondary ion mass spectrometry, localized vibrational mode far infrared spectroscopy, Hall-effect measurements, optical absorption, and photoluminescence. A quantitative model for the compensation mechanism in the semi-insulating material was developed based on these measurements. The free carrier concentration is controlled by the balance between EL2 deep donors and carbon acceptors; furthermore, the incorporation of EL2 is controlled by the melt stoichiometry, increasing as the As atom fraction in the melt increases. As a result, semi-insulating material can be grown only from melts above a critical As composition. The practical significance of these results is discussed in terms of achieving high yield and reproducibility in the crystal growth process.
Document ID
19820056868
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Holmes, D. E.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Chen, R. T.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Elliott, K. R.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Kirkpatrick, C. G.
(Rockwell International Corp., Microelectronics Research and Development Center Thousand Oaks, CA, United States)
Yu, P. W.
(Wright State University Dayton, OH, United States)
Date Acquired
August 10, 2013
Publication Date
July 1, 1982
Subject Category
Electronics And Electrical Engineering
Accession Number
82A40403
Funding Number(s)
CONTRACT_GRANT: NAS3-22224
CONTRACT_GRANT: F33615-81-C-1406
Distribution Limits
Public
Copyright
Other

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