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EL2 distributions in doped and undoped liquid encapsulated Czochralski GaAsThe longitudinal and radial distributions of EL2 in undoped semi-insulating and intentionally doped n-type GaAs crystals grown by the liquid encapsulated Czochralski technique are compared. Longitudinal profiles in undoped crystals are controlled by changes in melt stoichiometry as the crystal is pulled from the melt. EL2 profiles along crystals doped above about 1 x 10 to the 17th/cu cm, on the other hand, are controlled primarily by the carrier concentration as a result of the suppression of EL2 by free electrons. Radial EL2 profiles are typically W shaped and M shaped in undoped and doped (above threshold) crystals, respectively. The origin of these radial profiles is discussed in terms of residual stress, melt stoichiometry, and the suppresion of EL2 by electrons. The results are also discussed in the light of the antisite model for EL2.
Document ID
19830041538
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Holmes, D. E.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Chen, R. T.
(Rockwell International Corp. Thousand Oaks, CA, United States)
Yang, J.
(Rockwell International Microelectronics Research and Development Center Thousand Oaks, CA, United States)
Date Acquired
August 11, 2013
Publication Date
March 1, 1983
Publication Information
Publication: Applied Physics Letters
Volume: 42
Subject Category
Solid-State Physics
Accession Number
83A22756
Funding Number(s)
CONTRACT_GRANT: NAS3-22224
CONTRACT_GRANT: NAS3-22235
Distribution Limits
Public
Copyright
Other

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