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Minimum silicon wafer thickness for ID waferingAn analytical model, based on fracture mechanics analysis, is proposed for estimating the minimum wafer thickness as a function of the diameter requirement for solar cells. The conditions under which the model can be applied are discussed with reference to the critical flaw size, the applied force, and the width of the side support. It is shown that the equivalent cantilever force applied during ID slicing can be estimated from the wafering mechanical yield data. The width of the wafer side support was found to be a significant factor in controlling the minimum allowable wafer thickness during slicing. Wafer side support width requirements were found to increase with decreasing wafer thickness.
Document ID
19830041706
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Chen, C. P.
(California Institute of Technology, Jet Propulsion Laboratory, Pasadena CA, United States)
Date Acquired
August 11, 2013
Publication Date
December 1, 1982
Publication Information
Publication: Electrochemical Society
Subject Category
Energy Production And Conversion
Accession Number
83A22924
Distribution Limits
Public
Copyright
Other

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