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Plasma-enhanced CVD silicon nitride antireflection coatings for solar cellsMultilayer plasma-enhanced chemical vapor deposition (PECVD) silicon nitride antireflection coatings were deposited on space quality silicon solar cells. Preliminary experiments indicated that multilayer coatings decreased the total reflectance of polished silicon from 35 percent to less than 3 percent over the spectral range 0.4-1.0 micron. The solar cell energy conversion efficiency was increased from an average of 8.84 percent to an average of 12.63 percent.
Document ID
19830064877
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Johnson, C. C.
(NASA Ames Research Center Moffett Field, CA, United States)
Wydeven, T.
(NASA Ames Research Center Moffett Field, CA, United States)
Donohoe, K.
(Tegal Corp. Novato, CA, United States)
Date Acquired
August 11, 2013
Publication Date
January 1, 1983
Publication Information
Publication: Solar Energy
Volume: 31
Issue: 4, 19
ISSN: 0038-092X
Subject Category
Energy Production And Conversion
Accession Number
83A46095
Distribution Limits
Public
Copyright
Other

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