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Orientation and Morphology Effects in Rapid Silicon Sheet SolidificationRadial growth anisotropies and equilibrium forms of point nucleated, dislocation free silicon sheets spreading horizontally on the free surface of a silicon melt were measured for (100), (110), (111), and (112) sheet planes. The growth process was recorded. Qualitative Wulff surface free energy polar plots were deduced from the equilibrium shapes for each sheet plane. Predicted geometries for the tip shape of unidirectional, dislocation free, horizontally grown sheets growing in various directions within the planes were analyzed. Polycrystalline sheets and dendrite propagation were analyzed. For dendrites, growth rates on the order of 2.5 m/min and growth rate anisotropies of 25 are measured.
Document ID
19840020558
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ciszek, T. F.
(Midwest Research Inst. Golden, CO, United States)
Date Acquired
August 12, 2013
Publication Date
April 15, 1984
Publication Information
Publication: JPL Proc. of the Flat-Plate Solar Array Proj. Res. Forum on the High-Speed Growth and Characterization of Crystals for Solar Cells
Subject Category
Solid-State Physics
Accession Number
84N28627
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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