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Segregation of Impurities in Directionally Solidified SiliconHall measurements and four-point probe resistivity measurements are used to determine the concentration profile of boron and iron in doped semi-conductor silicon ingots grown by the Bridgman technique. The concentration profiles are fitted to the normal segregation equation and the effective segregation coefficient, K sub eff, is calculated. The average value of K sub eff, is 0.803 for boron. For iron, K sub eff, is concentration dependent and is in the range 0.00008 to 0.00012.
Document ID
19840020578
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ravishankar, P. S. (Exxon Research and Engineering Co. Linden, NJ, United States)
Younghouse, L. B. (Exxon Research and Engineering Co. Linden, NJ, United States)
Date Acquired
August 12, 2013
Publication Date
April 15, 1984
Publication Information
Publication: JPL Proc. of the Flat-Plate Solar Array Proj. Res. Forum on the High-Speed Growth and Characterization of Crystals for Solar Cells
Subject Category
Solid-State Physics
Accession Number
84N28647
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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IDRelationTitle19840020545Collected WorksProceedings of the Flat-plate Solar Array Project Research Forum on the High-speed Growth and Characterization of Crystals for Solar Cells
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