A low-cost polysilicon process based on the synthesis and decomposition of dichlorosilaneMajor process steps of a dichlorosilane based chemical vapor deposition (CVD) process for the production of polycrystalline silicon have been evaluated. While an economic analysis of the process indicates that it is not capable of meeting JPL/DOE price objectives ($14.00/kg in 1980 dollars), product price in the $19.00/kg to $25.00/kg range may be achieved. Product quality has been evaluated and ascertained to be comparable to semiconductor-grade polycrystalline silicon. Solar cells fabricated from the material are also equivalent to those fabricated from semiconductor-grade polycrystalline silicon.
Document ID
19840040180
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Mccormick, J. R. (Hemlock Semiconductor Corp. MI, United States)
Plahutnik, F. (Hemlock Semiconductor Corp. MI, United States)
Sawyer, D. (Hemlock Semiconductor Corp. MI, United States)
Arvidson, A. (Hemlock Semiconductor Corp. MI, United States)
Goldfarb, S. (Hemlock Semiconductor Corp. Hemlock, MI, United States)