Non-mass-analyzed ion implantation equipment for high volume solar cell productionEquipment designed for junction formation in silicon solar cells is described. The equipment, designed for a production level of approximately one megawatt per year, consists of an ion implanter and annealer. Low cost is achieved by foregoing the use of mass analysis during the implantation, and by the use of a belt furnace for annealing. Results of process development, machine design and cost analysis are presented.
Document ID
19840040285
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Armini, A. J. (Spire Corp. Bedford, MA, United States)
Bunker, S. N. (Spire Corp. Bedford, MA, United States)
Spitzer, M. B. (Spire Corp. Bedford, MA, United States)