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Advanced Vapor-Supply ManifoldAdvanced vapor-supply manifold solves problem of manifold purging. Design virtually eliminates dead gas volumes in manifold system. System incorporates special valve into manifold in way that leaks and contamination problems of previous systems, which use tees and three-port valves, are minimized or eliminated in both main manifold line and in supply line. Of considerable use in gas manifold systems where even small amounts of gaseous impurities constitute problem or where more than one gaseous material used in single system.
Document ID
19850000523
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Clark, I. O.
Debnam, William J., Jr.
Fripp, Archibald L., Jr.
Crouch, R. K.
Date Acquired
August 12, 2013
Publication Date
March 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 9
Issue: 4
ISSN: 0145-319X
Subject Category
Mechanics
Report/Patent Number
LAR-13259
Accession Number
85B10523
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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