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Numerical simulation of positive-potential conductors in the presence of a plasma and a secondary-emitting dielectricA 2 1/2-dimensional, cylindrically symmetric particle in cell program is used to simulate the interaction of a plasma with a positively biased disk covered by a dielectric material (Kapton). Several runs using different combinations of bias voltages and secondary electron yields are discussed. Special attention is paid to the role of the secondaries as the dielectric surface changes from a negative potential to become increasingly positive. This is termed the 'snapover' process. The contribution due to secondaries is examined by plotting the distribution (number versus position) of the particles emitted by the impacting on the dielectric. These plots show that secondaries are drawn back into the dielectric as well as the conductor in the case of snapover. Mechanisms and experimental implications for these particular distributions are discussed.
Document ID
19850053155
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Kessel, R. L.
(Kansas Univ. Lawrence, KS, United States)
Murray, R. A.
(Kansas Univ. Lawrence, KS, United States)
Hetzel, R.
(Kansas Univ. Lawrence, KS, United States)
Armstrong, T. P.
(Kansas, University Lawrence, KS, United States)
Date Acquired
August 12, 2013
Publication Date
June 1, 1985
Publication Information
Publication: Journal of Applied Physics
Volume: 57
ISSN: 0021-8979
Subject Category
Electronics And Electrical Engineering
Accession Number
85A35306
Funding Number(s)
CONTRACT_GRANT: NSG-3290
Distribution Limits
Public
Copyright
Other

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