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RF-sputtered silicon and hafnium nitrides - Properties and adhesion to 440C stainless steelSilicon nitride and hafnium nitride coatings were deposited by reactive RF sputtering on oxidized and unoxidized 440C stainless steel substrates. Sputtering was done in mixtures of argon and nitrogen gases from pressed powder silicon nitride and from hafnium metal targets. Depositions were at two background pressures, 8 and 20 mtorr, and at two different fractions (f) of nitrogen in argon, 0.25 and 0.60, for hafnium nitride and at f = 0.25 for silicon nitride. The coatings and the interface between the coating and substrates were investigated by X-ray diffractometry, scanning electron microscopy, energy dispersive X-ray analysis and Auger electron spectroscopy. A Knoop microhardness of 1650 + or 100 kg/sq mm was measured for hafnium nitride and 3900 + or 500 kg/sq mm for silicon nitride. The friction coefficients between a 440C rider and the coatings were measured under lubricated conditions. Scratch test results demonstrate that the adhesion of hafnium nitride to both oxidized and unoxidized 440C is superior to that of silicon nitride. Oxidized 440C is found to have increased adhesion, to both nitrides, over that of unoxidized 440C.
Document ID
19850054089
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Grill, A.
(Negev, University Beersheba, Israel)
Aron, P. R.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
August 12, 2013
Publication Date
January 1, 1983
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: Metallurgical coatings 1983
Location: San Diego, CA
Start Date: April 18, 1983
End Date: April 22, 1983
Accession Number
85A36240
Distribution Limits
Public
Copyright
Other

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