Planar techniques for fabricating X-ray diffraction gratings and zone platesThe state of current planar techniques in the fabrication of Fresnel zone plates and diffraction gratings is reviewed. Among the fabrication techniques described are multilayer resist techniques; scanning electron beam lithography; and holographic lithography. Consideration is also given to: X-ray lithography; ion beam lithography; and electroplating. SEM photographs of the undercut profiles obtained in a type AZ 135OB photoresistor by holographic lithography are provided.
Document ID
19850061124
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Smith, H. I. (Massachusetts Inst. of Tech. Cambridge, MA, United States)
Anderson, E. H. (Massachusetts Inst. of Tech. Cambridge, MA, United States)
Hawryluk, A. M. (Massachusetts Inst. of Tech. Cambridge, MA, United States)
Schattenburg, M. L. (MIT Cambridge, MA, United States)