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Dual-Flow-Rate ValveFlow-control device precisely adjusted for two rates. Heart of twoposition valve is sliding poppet. At far-right position, poppet allows low flow. At far-left position, allows high flow. Valve supplies high-pressure gas at either of two preselected flow rates. Valve adjustable between 0.12 and 1.2 lb/s (0.054 and 0.54 kg/s) of hydrogen at 3,300 lb/in.2 (23 MN/m2) and 80 degrees F (27 degrees C). Two flow rates preadjusted between these limits in increments of 0.01 lb/s (0.0045 kg/s).
Document ID
19860000072
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Allbritain, R. H.
(Rockwell International Corp.)
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 10
Issue: 1
ISSN: 0145-319X
Subject Category
Machinery
Report/Patent Number
MSC-20849
Accession Number
86B10072
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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