Optical and interfacial electronic properties of diamond-like carbon filmsHard, semitransparent carbon films were prepared on oriented polished crystal wafers of silicon, indium phosphide and gallium arsenide, as well as on KBr and quartz. Properties of the films were determined using IR and visible absorption spectrocopy, ellipsometry, conductance-capacitance spectroscopy and alpha particle-proton recoil spectroscopy. Preparation techniques include RF plasma decomposition of methane (and other hydrocarbons), ion beam sputtering, and dual-ion-beam sputter deposition. Optical energy band gaps as large as 2.7 eV and extinction coefficients lower than 0.1 at long wavelengths are found. Electronic state densities at the interface with silicon as low as 10 to the 10th states/eV sq cm per were found.
Document ID
19860031530
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Woollam, J. A. (Nebraska Univ. Lincoln, NE, United States)
Natarajan, V. (Nebraska Univ. Lincoln, NE, United States)
Lamb, J. (Nebraska Univ. Lincoln, NE, United States)
Khan, A. A. (Nebraska Univ. Lincoln, NE, United States)
Bu-Abbud, G. (Nebraska, University Lincoln, United States)
Banks, B. (Nebraska Univ. Lincoln, NE, United States)
Pouch, J. (Nebraska Univ. Lincoln, NE, United States)
Gulino, D. A. (Nebraska Univ. Lincoln, NE, United States)
Domitz, S. (Nebraska Univ. Lincoln, NE, United States)
Liu, D. C. (NASA Lewis Research Center Cleveland, OH, United States)