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Influence of process parameter variation on the reflectivity of sputter-deposited W-C multilayer diffraction gratingsMultilayer W-C diffraction gratings with nominal d spacings of 35 A have been fabricated by magnetron sputter deposition. The peak and integrated reflectivities of these films have been measured with Al K-alpha X-rays and compared to theoretical values. The rms surface roughness has been evaluated. The influence of several sputtering-system process parameters on the reflectivities has been investigated.
Document ID
19860062335
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
doi:10.1116/1.573862
Authors
Sager, B. (Wisconsin Univ. Madison, WI, United States)
Benson, P. (Wisconsin Univ. Madison, WI, United States)
Jahoda, K. (Wisconsin Univ. Madison, WI, United States)
Jacobs, J. R. (Wisconsin Univ. Madison, WI, United States)
Bloch, J. J. (Wisconsin, University Madison, United States)
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: Journal of Vacuum Science and Technology A
Volume: 4
ISSN: 0734-2101
Subject Category
Optics
Accession Number
86A47073
Funding Number(s)
CONTRACT_GRANT: NAG5-629
Distribution Limits
Public
Copyright
Other

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