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Stigmatically focusing partial pressure analyzer with dual chamber ion sourceThe partial pressure analyzer developed has a high absolute sensitivity and high resolution. Interaction effects, as they occur in conventional partial pressure analyzers between the heating filament for the emission of electrons and the residual gas, are suppressed by removing the heating filament from the measurement area. The electron beam is generated in an auxiliary vacuum compartment, and passes subsequently through an aperture into the ionization compartment. The probability is small, therefore, that the presence of substances produced at the heating filament by chemical reactions and thermal decompositions will have disturbing effects. The high sensitivity and resolution of the instrument are obtained with the aid of an electron path configuration of unconventional characteristics.
Document ID
19870020367
Acquisition Source
Legacy CDMS
Document Type
Thesis/Dissertation
Authors
Rasskopf, Klaus F.
(NASA Headquarters Washington, DC United States)
Date Acquired
September 5, 2013
Publication Date
September 1, 1987
Subject Category
Instrumentation And Photography
Report/Patent Number
NASA-TT-20059
NAS 1.77:20059
Accession Number
87N29800
Funding Number(s)
CONTRACT_GRANT: NASW-4006
Distribution Limits
Public
Copyright
Public Use Permitted.
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