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Dislocation dynamics during the growth of silicon ribbonThe thermal viscoplastic stresses and the dislocation densities in silicon ribbon are computed for an axially changing thermal profile by using an iterative finite difference method. A material constitutive equation (Haasen-Sumino model) which involves an internal variable (mobile dislocation density) is used. The results are interpreted as showing that there is a maximum width of silicon ribbon that can be grown when viscoplasticity and dislocations are considered. This maximum width limitation does not exist if the material behavior is elastic.
Document ID
19870025025
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Dillon, O. W., Jr.
(Kentucky Univ. Lexington, KY, United States)
Tsai, C. T.
(Kentucky Univ. Lexington, KY, United States)
De Angelis, R. J.
(Kentucky, University Lexington, United States)
Date Acquired
August 13, 2013
Publication Date
September 1, 1986
Publication Information
Publication: Journal of Applied Physics
Volume: 60
ISSN: 0021-8979
Subject Category
Solid-State Physics
Accession Number
87A12299
Funding Number(s)
CONTRACT_GRANT: JPL-956571
Distribution Limits
Public
Copyright
Other

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