Modeling free convective gravitational effects in chemical vapor depositionIn this paper, a combined fluid-mechanics, mass-transport, and chemistry model describing CVD in an open-tube atmospheric-pressure flow reactor is developed. The model allows gas-phase reactions to proceed to equilibrium and accounts for finite reaction rates at the surface of the deposition substrate. This model is a useful intermediate step toward a model employing fully rate-limited chemistry. The model is used to predict the effects of free convection on flow patterns, temperature and species-concentration profiles, and local deposition rates for silicon deposited by silane pyrolysis. These results are discussed in terms of implications for CVD of silicon and other compounds, microgravity studies, and techniques for testing and validating the model.
Document ID
19870035278
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Stinespring, C. D. (Aerodyne Research, Inc. Billerica, MA, United States)
Annen, K. D. (Aerodyne Products Corp. Billerica, MA, United States)