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Ellipsometric and optical study of amorphous hydrogenated carbon filmsA low-frequency plasma deposition system was used to prepare amorphous hydrogenated carbon (a-C:H) films. The growth energy was varied by changing the power and/or pressure of the plasma. Ellipsometry and optical absorption were used to obtain the optical energy gap, the density of states, and the refractive index. Ion sputtering was used in conjunction with ellipsometry and Auger electron spectroscopy to get absolute sputtering rates. The plasma deposited a-C:H is amorphous with an optical energy gap of approximately 2.0-2.4 eV. These a-C:H films have higher density and/or hardness, higher refractive index, and lower optical energy gaps with increasing energy of the particles in the plasma, while the density of states remains unchanged. These results are in agreement with, and give a fine-tuned positive confirmation to, an existing conjecture on the nature of the a-C:H films (Kaplan et al., 1985).
Document ID
19870036693
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Alterovitz, S. A.
(NASA Lewis Research Center Cleveland, OH, United States)
Warner, J. D.
(NASA Lewis Research Center Cleveland, OH, United States)
Liu, D. C.
(NASA Lewis Research Center Cleveland, OH, United States)
Pouch, J. J.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
August 13, 2013
Publication Date
November 1, 1986
Publication Information
Publication: Electrochemical Society, Journal
Volume: 133
ISSN: 0013-4651
Subject Category
Solid-State Physics
Accession Number
87A23967
Distribution Limits
Public
Copyright
Other

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