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Chemical effects in ion mixing of a ternary system (metal-SiO2)The mixing of Ti, Cr, and Ni thin films with SiO2 by low-temperature (- 196-25 C) irradiation with 290 keV Xe has been investigated. Comparison of the morphology of the intermixed region and the dose dependences of net metal transport into SiO2 reveals that long range motion and phase formation probably occur as separate and sequential processes. Kinetic limitations suppress chemical effects in these systems during the initial transport process. Chemical interactions influence the subsequent phase formation.
Document ID
19870047644
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Banwell, T.
(California Inst. of Tech. Pasadena, CA, United States)
Nicolet, M.-A.
(California Institute of Technology Pasadena, United States)
Sands, T.
(Bell Communications Research, Inc. Red Bank, NJ, United States)
Grunthaner, P. J.
(California Institute of Technology Jet Propulsion Laboratory, Pasadena, United States)
Date Acquired
August 13, 2013
Publication Date
March 9, 1987
Publication Information
Publication: Applied Physics Letters
Volume: 50
ISSN: 0003-6951
Subject Category
Solid-State Physics
Accession Number
87A34918
Funding Number(s)
CONTRACT_GRANT: NSF DMR-84-21119
CONTRACT_GRANT: N00014-84-K-0275
Distribution Limits
Public
Copyright
Other

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