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Annealing of electron damage in mid-IR transmitting fluoride glassDamage in ZrF4-BaF2-LaF3 glass induced by high-energy electrons was studied by ESR and optical spectroscopy. An optical absorption band at 314 nm in the irradiated glass annealed rapidly above about 50 C, probably by a second-order reaction at room temperature; the ESR lines annealed very slowly at room temperature.
Document ID
19870066378
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
doi:10.1016/0025-5408(86)90183-2
Authors
Bansal, Narottam P. (NASA Lewis Research Center Cleveland, OH; Rensselaer Polytechnic Institute, Troy, NY, United States)
Doremus, Robert H. (Rensselaer Polytechnic Institute, Troy, NY, United States)
Date Acquired
August 13, 2013
Publication Date
January 1, 1986
Publication Information
Publication: Materials Research Bulletin
Volume: 21
Issue: 3 19
ISSN: 0025-5408
Subject Category
Nonmetallic Materials
Accession Number
87A53652
Funding Number(s)
CONTRACT_GRANT: JPL-955870
Distribution Limits
Public
Copyright
Other

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