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Dual-Cathode Electron-Beam SourceBeam from either cathode electromagnetically aligned with exit port. Electron beam from either of two cathodes deflected by magnetic and electric fields to central axis. Mechanical alignment of beam easy because cathode axes, anode apertures, and electron trajectories coplanar. Applications where uninterrupted service needed: scanning electron microscopes, transmission electron microscopes, electron-beam lithography equipment, Auger instruments, and microfocused x-ray sources.
Document ID
19880000321
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Bradley, James G.
(Caltech)
Conley, Joseph M.
(Caltech)
Wittry, David B.
(University of Southern California)
Date Acquired
August 13, 2013
Publication Date
June 1, 1988
Publication Information
Publication: NASA Tech Briefs
Volume: 12
Issue: 6
ISSN: 0145-319X
Subject Category
Electronic Components And Circuits
Report/Patent Number
NPO-16878
Accession Number
88B10321
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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