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Grazing incidence reflectance of SiC films produced by plasma-assisted chemical vapor depositionThe grazing incidence reflectance of silicon carbide films produced by plasma-assisted chemical vapor deposition has been evaluated in the spectral region from 256 to 1216 A. The results show that reflectivities higher than conventional coatings can be obtained on coatings deposited both on silicon wafers and quartz substrates. Potential application of silicon carbide films for EUV astronomical instruments will be discussed.
Document ID
19880047796
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Keski-Kuha, Ritva A. M. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Osantowski, John F. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Toft, Albert R. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Partlow, William D. (Westinghouse Research and Development Center Pittsburgh, PA, United States)
Date Acquired
August 13, 2013
Publication Date
April 15, 1988
Publication Information
Publication: Applied Optics
Volume: 27
ISSN: 0003-6935
Subject Category
Optics
Accession Number
88A35023
Funding Number(s)
CONTRACT_GRANT: F49260-84-C-0063
Distribution Limits
Public
Copyright
Other

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