Commercial aspects of epitaxial thin film growth in outer spaceA new concept for materials processing in space exploits the ultra vacuum component of space for thin film epitaxial growth. The unique low earth orbit space environment is expected to yield 10 to the -14th torr or better pressures, semiinfinite pumping speeds and large ultra vacuum volume (about 100 cu m) without walls. These space ultra vacuum properties promise major improvement in the quality, unique nature, and the throughput of epitaxially grown materials especially in the area of semiconductors for microelectronics use. For such thin film materials there is expected a very large value added from space ultra vacuum processing, and as a result the application of the epitaxial thin film growth technology to space could lead to major commercial efforts in space.
Document ID
19880065093
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ignatiev, Alex (Houston Univ. TX, United States)
Chu, C. W. (Houston, University TX, United States)
Date Acquired
August 13, 2013
Publication Date
January 1, 1988
Subject Category
Materials Processing
Meeting Information
Meeting: Space Congress
Location: Cocoa Beach, FL
Country: United States
Start Date: April 26, 1988
End Date: April 29, 1988
Sponsors: Canaveral Council of technical Societies