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Spinner For Etching Of Semiconductor WafersSimple, inexpensive apparatus coats semiconductor wafers uniformly with hydrofluoric acid for etching. Apparatus made in part from small commercial electric-fan motor. Features bowl that collects acid. Silicon wafer placed on platform and centered on axis; motor switched on. As wafer spins, drops of hydrofluoric acid applied from syringe. Centrifugal force spreads acid across wafer in fairly uniform sheet.
Document ID
19890000205
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Lombardi, Frank
(Caltech)
Date Acquired
August 14, 2013
Publication Date
April 1, 1989
Publication Information
Publication: NASA Tech Briefs
Volume: 13
Issue: 4
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-16912
Accession Number
89B10205
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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