NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Laser/Plasma/Chemical-Vapor Deposition Of DiamondProposed process for deposition of diamond films includes combination of plasma induced in hydrocarbon feed gas by microwave radiation and irradiation of plasma and substrate by lasers. Deposition of graphite suppressed. Reaction chamber irradiated at wavelength favoring polymerization of CH2 radical into powders filtered out of gas. CH3 radicals, having desired sp3 configuration, remains in gas to serve as precursors for deposition. Feed gas selected to favor formation of CH3 radicals; candidates include CH4, C2H4, C2H2, and C2H6. Plasma produced by applying sufficient power at frequency of 2.45 GHz and adjusting density of gas to obtain electron kinetic energies around 100 eV in low-pressure, low-temperature regime.
Document ID
19890000259
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Hsu, George C.
(Caltech)
Date Acquired
August 14, 2013
Publication Date
May 1, 1989
Publication Information
Publication: NASA Tech Briefs
Volume: 13
Issue: 5
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-17487
Accession Number
89B10259
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

Available Downloads

There are no available downloads for this record.
No Preview Available