Coating Solar Cells By Microwave Plasma Deposition

Antireflection films deposited on silicon solar cells at high production rates with microwave-enhanced plasma deposition. Microwave energy at frequency of 2.45 GHz generates plasma in mixture of gases, from which thin film of silicon nitride deposits on silicon substrates. Reaction temperature relatively low (only 250 degrees C), and film deposition rate more than 500 Angstrom/minute - 2 to 5 times faster. Quality of antireflection film similar to that produced by chemical-vapor deposition. Uses less power and consumes smaller quantities of gas. Species formed in plasma longer lived and dissociate reactants in region of chamber well away from plasma-generation region.